Invention Grant
US08946745B2 Supporting substrate for manufacturing vertically-structured semiconductor light-emitting device and semiconductor light-emitting device using the supporting substrate 有权
用于制造垂直结构的半导体发光器件的支撑衬底和使用该支撑衬底的半导体发光器件

  • Patent Title: Supporting substrate for manufacturing vertically-structured semiconductor light-emitting device and semiconductor light-emitting device using the supporting substrate
  • Patent Title (中): 用于制造垂直结构的半导体发光器件的支撑衬底和使用该支撑衬底的半导体发光器件
  • Application No.: US13054472
    Application Date: 2009-07-15
  • Publication No.: US08946745B2
    Publication Date: 2015-02-03
  • Inventor: Tae Yeon Seong
  • Applicant: Tae Yeon Seong
  • Applicant Address: KR Seoul
  • Assignee: LG Innotek Co., Ltd.
  • Current Assignee: LG Innotek Co., Ltd.
  • Current Assignee Address: KR Seoul
  • Agency: KED & Associates LLP
  • Priority: KR10-2008-0068536 20080715
  • International Application: PCT/KR2009/003905 WO 20090715
  • International Announcement: WO2010/008209 WO 20100121
  • Main IPC: H01L33/10
  • IPC: H01L33/10 H01L33/00 H01L21/762 H01L33/62 H01L33/40
Supporting substrate for manufacturing vertically-structured semiconductor light-emitting device and semiconductor light-emitting device using the supporting substrate
Abstract:
The present invention is related to a supporting substrate for manufacturing vertically-structured semiconductor light emitting device and a vertically-structured semiconductor light emitting device using the same, which minimize damage and breaking of a multi-layered light-emitting structure thin film separated from a sapphire substrate during the manufacturing process, thereby improving the whole performance of the semiconductor light emitting device.The supporting substrate for manufacturing the vertically-structured semiconductor light emitting device of the present invention comprises: a selected supporting substrate formed of a material having a difference of thermal expansion coefficient of 5 ppm or less from a sapphire substrate on which a multi-layered light-emitting structure thin film comprising a Group III-V nitride-based semiconductor is laminated; a sacrificial layer formed on the selected supporting substrate; a thick metal film formed on an upper part of the sacrificial layer; and a bonding layer formed on an upper part of the thick metal layer and formed of a soldering or brazing alloy material.
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