Invention Grant
- Patent Title: Semiconductor component with optimized edge termination
- Patent Title (中): 半导体元件具有优化的边缘终止
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Application No.: US14361376Application Date: 2012-09-06
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Publication No.: US08946867B2Publication Date: 2015-02-03
- Inventor: Reiner Barthelmess , Hans-Joachim Schulze , Uwe Kellner-Werdehausen , Josef Lutz , Thomas Basler
- Applicant: Reiner Barthelmess , Hans-Joachim Schulze , Uwe Kellner-Werdehausen , Josef Lutz , Thomas Basler
- Applicant Address: DE
- Assignee: Infineon Technologies Bipolar GmbH & Co. KG
- Current Assignee: Infineon Technologies Bipolar GmbH & Co. KG
- Current Assignee Address: DE
- Agency: Cantor Colburn LLP
- Priority: DE102011087487 20111130
- International Application: PCT/EP2012/067441 WO 20120906
- International Announcement: WO2013/079235 WO 20130606
- Main IPC: H01L29/861
- IPC: H01L29/861 ; H01L29/06 ; H01L29/36

Abstract:
A semiconductor component includes a two-sided semiconductor body, an inner zone with a basic doping of a first conduction type, and two semiconductor zones. The first zone, disposed between the first side and inner zone, is of the first conduction type with a doping concentration higher than that of the inner zone. The second zone, disposed between the second side and inner zone, is of a second conduction type complementary to the first type with a doping concentration higher than that of the inner zone. At least one first edge chamfer extends at a first angle to the extension plane of the transition from the second zone to the inner zone at least along the edge of the second zone and inner zone.At least one buried zone of the second conduction type is provided between the first zone and inner zone, and extends substantially parallel to the first zone.
Public/Granted literature
- US20140327114A1 SEMICONDUCTOR COMPONENT WITH OPTIMIZED EDGE TERMINATION Public/Granted day:2014-11-06
Information query
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