Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US13013333Application Date: 2011-01-25
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Publication No.: US08947630B2Publication Date: 2015-02-03
- Inventor: Alexander Viktorovych Padiy , Boris Menchtchikov , Scott Anderson Middlebrooks
- Applicant: Alexander Viktorovych Padiy , Boris Menchtchikov , Scott Anderson Middlebrooks
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/68 ; G03F7/20
Abstract:
A method controls scanning function of a lithographic apparatus. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control parameters are retrieved from the monitor wafer. Parameter drift is determined from the baseline control parameters. Compensation is performed based on the determination. A different parameterization is used for control of the scanning control module than for communication between the scanning control module and the lithographic apparatus.
Public/Granted literature
- US20110205511A1 Lithographic Apparatus and Device Manufacturing Method Public/Granted day:2011-08-25
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