Invention Grant
- Patent Title: Illumination optical system, exposure apparatus, and device manufacturing method
- Patent Title (中): 照明光学系统,曝光装置和装置制造方法
-
Application No.: US13168068Application Date: 2011-06-24
-
Publication No.: US08947635B2Publication Date: 2015-02-03
- Inventor: Hirohisa Tanaka , Yasushi Mizuno
- Applicant: Hirohisa Tanaka , Yasushi Mizuno
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G02B27/09 ; G03F7/20

Abstract:
According to one embodiment, an illumination optical system is provided with an optical integrator which forms a predetermined light intensity distribution on an illumination pupil plane in an illumination optical path of the illumination optical system with incidence of exposure light from a light source device thereinto; a transmission filter arranged on the reticle side with respect to the optical integrator and in a first adjustment region set including the illumination pupil plane in an optical-axis direction of the illumination optical system, and having a transmittance characteristic varying according to positions of the exposure light incident thereinto; and a movement mechanism which moves the transmission filter along the optical-axis direction in the first adjustment region.
Public/Granted literature
- US20120015306A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2012-01-19
Information query