Invention Grant
US08947635B2 Illumination optical system, exposure apparatus, and device manufacturing method 有权
照明光学系统,曝光装置和装置制造方法

Illumination optical system, exposure apparatus, and device manufacturing method
Abstract:
According to one embodiment, an illumination optical system is provided with an optical integrator which forms a predetermined light intensity distribution on an illumination pupil plane in an illumination optical path of the illumination optical system with incidence of exposure light from a light source device thereinto; a transmission filter arranged on the reticle side with respect to the optical integrator and in a first adjustment region set including the illumination pupil plane in an optical-axis direction of the illumination optical system, and having a transmittance characteristic varying according to positions of the exposure light incident thereinto; and a movement mechanism which moves the transmission filter along the optical-axis direction in the first adjustment region.
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