Invention Grant
- Patent Title: Gated diode memory cells
- Patent Title (中): 门控二极管存储单元
-
Application No.: US12512559Application Date: 2009-07-30
-
Publication No.: US08947927B2Publication Date: 2015-02-03
- Inventor: Wing K. Luk , Robert H. Dennard
- Applicant: Wing K. Luk , Robert H. Dennard
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: F. Chau & Associates, LLC
- Main IPC: G11C11/405
- IPC: G11C11/405

Abstract:
A gated diode memory cell is provided, including one or more transistors, such as field effect transistors (“FETs”), and a gated diode in signal communication with the FETs such that the gate of the gated diode is in signal communication with the source of a first FET, wherein the gate of the gated diode forms one terminal of the storage cell and the source of the gated diode forms another terminal of the storage cell, the drain of the first FET being in signal communication with a bitline (“BL”) and the gate of the first FET being in signal communication with a write wordline (“WLw”), and the source of the gated diode being in signal communication with a read wordline (“WLr”).
Public/Granted literature
- US20090285018A1 Gated Diode Memory Cells Public/Granted day:2009-11-19
Information query
IPC分类: