Invention Grant
US08947940B2 Structure and method for healing tunnel dielectric of non-volatile memory cells
有权
用于愈合非易失性记忆单元的隧道电介质的结构和方法
- Patent Title: Structure and method for healing tunnel dielectric of non-volatile memory cells
- Patent Title (中): 用于愈合非易失性记忆单元的隧道电介质的结构和方法
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Application No.: US13361191Application Date: 2012-01-30
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Publication No.: US08947940B2Publication Date: 2015-02-03
- Inventor: Fuchen Mu , Yanzhuo Wang
- Applicant: Fuchen Mu , Yanzhuo Wang
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
A semiconductor device comprises an array of memory cells. Each of the memory cells includes a tunnel dielectric, a well region including a first current electrode and a second current electrode, and a control gate. The first and second current electrodes are adjacent one side of the tunnel dielectric and the control gate is adjacent another side of the tunnel dielectric. A controller is coupled to the memory cells. The controller includes logic to determine when to perform a healing process in the tunnel dielectric of the memory cells, and to apply a first voltage to the first current electrode of the memory cells during the healing process to remove trapped electrons and holes from the tunnel dielectric.
Public/Granted literature
- US20130194875A1 STRUCTURE AND METHOD FOR HEALING TUNNEL DIELECTRIC OF NON-VOLATILE MEMORY CELLS Public/Granted day:2013-08-01
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