Invention Grant
- Patent Title: Surface inspecting apparatus and method for calibrating same
- Patent Title (中): 表面检查装置及其校准方法
-
Application No.: US13202734Application Date: 2010-02-02
-
Publication No.: US08949043B2Publication Date: 2015-02-03
- Inventor: Kenji Oka , Kenji Mitomo , Kenichiro Komeda
- Applicant: Kenji Oka , Kenji Mitomo , Kenichiro Komeda
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2009-046279 20090227
- International Application: PCT/JP2010/051441 WO 20100202
- International Announcement: WO2010/098179 WO 20100902
- Main IPC: G01N21/94
- IPC: G01N21/94 ; G01N21/93 ; G01N21/95

Abstract:
While an illumination optical system is irradiating the surface of a contaminated standard wafer with illumination light, this illumination light is scanned over the surface of the contaminated standard wafer, then detectors of a detection optical system each detect the light scattered from the surface of the contaminated standard wafer, next a predefined reference value in addition to detection results on the scattered light is used to calculate a compensation parameter “Comp” for detection sensitivity correction of photomultiplier tubes of the detectors, and the compensation parameter “Comp” is separated into a time-varying deterioration parameter “P”, an optical characteristics parameter “Opt”, and a sensor characteristics parameter “Lr”, and correspondingly managed. This makes is easy to calibrate the detection sensitivity.
Public/Granted literature
- US20120046884A1 SURFACE INSPECTING APPARATUS AND METHOD FOR CALIBRATING SAME Public/Granted day:2012-02-23
Information query