Invention Grant
- Patent Title: Measurement method and measurement system using the same
- Patent Title (中): 测量方法和使用该测量方法的测量系统
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Application No.: US13182909Application Date: 2011-07-14
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Publication No.: US08949064B2Publication Date: 2015-02-03
- Inventor: Hyun-cheol Lee , In-kap Chang , Seung-hoon Tong
- Applicant: Hyun-cheol Lee , In-kap Chang , Seung-hoon Tong
- Applicant Address: KR Gyeonggi-Do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-Do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2010-0104245 20101025
- Main IPC: G01D1/00
- IPC: G01D1/00 ; G06Q30/02 ; G06Q10/00

Abstract:
Example embodiments relate to a measurement method of measuring lots with improved process efficiency. The measurement method may include calculating a measurement capability (indicating a degree to which members to be measured may be processed per unit time in a measurement device); allocating the measurement capability according to a processing device and a processing condition; and calculating a measurement ratio of the lots processed by the processing device and the processing condition.
Public/Granted literature
- US20120101619A1 MEASUREMENT METHOD AND MEASUREMENT SYSTEM USING THE SAME Public/Granted day:2012-04-26
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