Invention Grant
US08949748B2 Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method
有权
用于产生掩模数据的记录介质记录程序，掩模制造方法和曝光方法
- Patent Title: Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method
- Patent Title (中): 用于产生掩模数据的记录介质记录程序，掩模制造方法和曝光方法
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Application No.: US13280735Application Date: 2011-10-25
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Publication No.: US08949748B2Publication Date: 2015-02-03
- Inventor: Hiroyuki Ishii , Kouichirou Tsujita
- Applicant: Hiroyuki Ishii , Kouichirou Tsujita
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2010-244368 20101029
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/36 ; G03F7/20
Abstract:
A mask includes a main pattern for resolving a target pattern to be formed on a substrate and an auxiliary pattern not resolving. Values of parameters of the main pattern and the auxiliary pattern are set. An image is calculated that is formed when the main pattern and the auxiliary pattern determined by the values of the parameters of the main pattern and the auxiliary pattern are projected by a projection optical system. Based on a result of the calculation that is performed by modifying the values of the parameters of the main pattern and the auxiliary pattern, the values of the parameters of the main pattern and the auxiliary pattern are determined to generate data of the mask including the main pattern and the auxiliary pattern determined.
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