Invention Grant
US08950057B2 Parallel-plate structure fabrication method 有权
平行板结构制造方法

Parallel-plate structure fabrication method
Abstract:
A fabrication method for parallel-plate structures and a parallel-plate structure arrangement, wherein the structures have a middle layer, grown on a substrate and disposed between top and bottom electrode layers, wherein the middle layer and the top and bottom electrode layers are deposited on a bottom substrate, and wherein the middle layer is grown first and the top and bottom electrodes are essentially deposited afterwards.
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