Invention Grant
US08950322B2 Evaporative systems and methods for dampening fluid control in a digital lithographic system
有权
用于抑制数字光刻系统中流体控制的蒸发系统和方法
- Patent Title: Evaporative systems and methods for dampening fluid control in a digital lithographic system
- Patent Title (中): 用于抑制数字光刻系统中流体控制的蒸发系统和方法
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Application No.: US13426209Application Date: 2012-03-21
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Publication No.: US08950322B2Publication Date: 2015-02-10
- Inventor: Chu-heng Liu , Peter Knausdorf
- Applicant: Chu-heng Liu , Peter Knausdorf
- Applicant Address: US CT Norwalk
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: US CT Norwalk
- Agency: Prass LLP
- Agent Ronald E. Prass, Jr.
- Main IPC: B41F7/24
- IPC: B41F7/24 ; B41N3/08

Abstract:
A system and corresponding methods are disclosed for controlling the thickness of a layer of dampening fluid applied to a reimageable surface of an imaging member in a variable data lithography system. Following deposition of the dampening fluid layer, a gas is passed over a region of the fluid layer prior to pattern forming. The gas causes a controlled amount of the dampening fluid layer to evaporate such that the remaining layer is of a desired and controlled thickness. Among other advantages, improved print quality is obtained.
Public/Granted literature
- US20130247787A1 Evaporative Systems and Methods for Dampening Fluid Control in a Digital Lithographic System Public/Granted day:2013-09-26
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