Invention Grant
US08951428B2 Method for the fabrication of periodic structures on polymers using plasma processes
有权
使用等离子体工艺制备聚合物周期性结构的方法
- Patent Title: Method for the fabrication of periodic structures on polymers using plasma processes
- Patent Title (中): 使用等离子体工艺制备聚合物周期性结构的方法
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Application No.: US12997701Application Date: 2009-06-15
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Publication No.: US08951428B2Publication Date: 2015-02-10
- Inventor: Evangelos Gogolides , Angeliki Tserepi , Vassilios Constantoudis , Nikolaos Vourdas , Georgios Boulousis , Maria-Elena Vlachopoulou , Aikaterini Tsougeni , Dimitrios Kontziampasis
- Applicant: Evangelos Gogolides , Angeliki Tserepi , Vassilios Constantoudis , Nikolaos Vourdas , Georgios Boulousis , Maria-Elena Vlachopoulou , Aikaterini Tsougeni , Dimitrios Kontziampasis
- Agency: Saul Ewing LLP
- Agent Gianna Julian-Arnold
- Priority: GR080100404 20080613
- International Application: PCT/GR2009/000039 WO 20090615
- International Announcement: WO2009/150479 WO 20091217
- Main IPC: B44C1/22
- IPC: B44C1/22 ; B29C59/14 ; B29K25/00 ; B29K33/00 ; B29K67/00 ; B29K83/00
Abstract:
This invention presents a method for the fabrication of periodic nanostructures on polymeric surfaces by means of plasma processing, which method comprises the following steps: (i) provision of a homogeneous organic polymer (such as PMMA, or PET, or PEEK, or PS, or PE, or COC) or inorganic polymer (such as PDMS or ORMOCER); (ii) exposure of the polymer to an etching plasma such as oxygen (O2) or sulphur hexafluoride (SF6) or a mixture of oxygen (O2) and sulphur hexafluoride (SF6), or mixtures of etching gases with inert gases such as any Noble gas (Ar, He, Ne, Xe).
Public/Granted literature
- US20110165382A1 Method for the fabrication of periodic structures on polymers using plasma processes Public/Granted day:2011-07-07
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