Invention Grant
- Patent Title: Electrochemical cell structure and method of fabrication
- Patent Title (中): 电化学电池结构及制造方法
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Application No.: US11598738Application Date: 2006-11-14
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Publication No.: US08951601B2Publication Date: 2015-02-10
- Inventor: Shunpu Li , Masaya Ishida
- Applicant: Shunpu Li , Masaya Ishida
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: GB0524075.9 20051125
- Main IPC: B05D5/12
- IPC: B05D5/12

Abstract:
One limitation to the realisation of mass produced electrochemical cells is a lack of high resolution patterning techniques providing accurate alignment. A method of fabricating a patterned structure on a polymer layer for the manufacture of an electrochemical cell is provided. The method comprises: depositing a polymer layer upon a substrate; and stamping the polymer layer to form an embossed polymer layer using an embossing tool, the embossing tool having a first array of adjacent cells, spaced from one another and extending from the stamping face of the embossing tool and thereby forming a second array of adjacent cells, spaced from one another and extending as cavities within the embossed polymer layer.
Public/Granted literature
- US20070119048A1 Electrochemical cell structure and method of fabrication Public/Granted day:2007-05-31
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