Invention Grant
- Patent Title: Method for depositing high aspect ratio molecular structures
- Patent Title (中): 沉积高纵横比分子结构的方法
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Application No.: US12281888Application Date: 2007-03-07
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Publication No.: US08951602B2Publication Date: 2015-02-10
- Inventor: David P. Brown , Albert G. Nasibulin , Esko I. Kauppinen , David Gonzales
- Applicant: David P. Brown , Albert G. Nasibulin , Esko I. Kauppinen , David Gonzales
- Applicant Address: FI
- Assignee: Canatu Oy
- Current Assignee: Canatu Oy
- Current Assignee Address: FI
- Agency: Studebaker & Brackett PC
- Priority: FI20060227 20060308
- International Application: PCT/FI2007/000059 WO 20070307
- International Announcement: WO2007/101907 WO 20070913
- Main IPC: B82Y10/00
- IPC: B82Y10/00 ; B82Y30/00 ; B82Y40/00 ; C01B31/02 ; B82B3/00
Abstract:
A method for depositing high aspect ratio molecular structures (HARMS), which method comprises applying a force upon an aerosol comprising one or more HARM-structures, which force moves one or more HARM-structures based on one or more physical features and/or properties towards one or more predetermined locations for depositing one or more HARM-structures in a pattern by means of an applied force.
Public/Granted literature
- US20090304945A1 METHOD FOR DEPOSITING HIGH ASPECT RATIO MOLECULAR STRUCTURES Public/Granted day:2009-12-10
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