Invention Grant
- Patent Title: Doping control by ALD surface functionalization
- Patent Title (中): 通过ALD表面官能化进行兴奋剂控制
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Application No.: US13370602Application Date: 2012-02-10
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Publication No.: US08951615B2Publication Date: 2015-02-10
- Inventor: Jeffrey W. Elam , Angel Yanguas-Gil
- Applicant: Jeffrey W. Elam , Angel Yanguas-Gil
- Applicant Address: US IL Chicago
- Assignee: UChicago Argonne, LLC
- Current Assignee: UChicago Argonne, LLC
- Current Assignee Address: US IL Chicago
- Agency: Foley & Lardner LLP
- Main IPC: C23C16/44
- IPC: C23C16/44 ; B05D5/06 ; C23C16/08 ; C23C16/455

Abstract:
Systems and methods for producing a material of desired thickness. Deposition techniques such as atomic layer deposition are alter to control the thickness of deposited material. A funtionalization species inhibits the deposition reaction.
Public/Granted literature
- US20120213946A1 Doping Control by ALD Surface Functionalization Public/Granted day:2012-08-23
Information query
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