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US08951615B2 Doping control by ALD surface functionalization 有权
通过ALD表面官能化进行兴奋剂控制

Doping control by ALD surface functionalization
Abstract:
Systems and methods for producing a material of desired thickness. Deposition techniques such as atomic layer deposition are alter to control the thickness of deposited material. A funtionalization species inhibits the deposition reaction.
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