Invention Grant
- Patent Title: Adjustable photo-mask
- Patent Title (中): 可调节光罩
-
Application No.: US13786557Application Date: 2013-03-06
-
Publication No.: US08951699B2Publication Date: 2015-02-10
- Inventor: Chia-Chin Chiang , Chien-Chia Tseng
- Applicant: National Kaohsiung University of Applied Sciences
- Applicant Address: TW Kaohsiung
- Assignee: National Kaohsiung University of Applied Science
- Current Assignee: National Kaohsiung University of Applied Science
- Current Assignee Address: TW Kaohsiung
- Agency: Kamrath IP Lawfirm, P.A.
- Agent Alan D. Kamrath
- Priority: TW102102237A 20130121
- Main IPC: G03F1/14
- IPC: G03F1/14 ; G03F1/00

Abstract:
An adjustable photo-mask for providing variable properties includes a casing and a plate. The casing has a receiving room inside and a plurality of openings, with the openings extending from the receiving room to a front face of the casing. The plate has a plurality of through holes, with an axial direction of the through holes defined as a ray-transmission direction, with the plate slideably received in the receiving room, and with the through holes and the openings totally or partially overlapping in the ray-transmission direction.
Public/Granted literature
- US20140205935A1 Adjustable Photo-Mask Public/Granted day:2014-07-24
Information query