Invention Grant
- Patent Title: Resist composition and method for producing resist pattern
- Patent Title (中): 抗蚀剂组合物和抗蚀剂图案的制造方法
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Application No.: US13280969Application Date: 2011-10-25
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Publication No.: US08951709B2Publication Date: 2015-02-10
- Inventor: Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
- Applicant: Tatsuro Masuyama , Satoshi Yamamoto , Koji Ichikawa
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-239428 20101026
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20 ; G03F7/004 ; G03F7/039
Abstract:
A resist composition contains a resin having a structural unit represented by the formula (aa) and a structural unit represented by the formula (ab); and an acid generator, wherein Raa1 represents a hydrogen atom and a methyl group; Aaa1 represents an optionally substituted C1 to C6 alkanediyl group etc.; Raa2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; Rab1 represents a hydrogen atom and a methyl group; Aab1 represents a single bond, an optionally substituted C1 to C6 alkanediyl group etc.; W1 represents an optionally substituted C4 to C36 alicyclic hydrocarbon group; n represents 1 or 2; Aab2 in each occurrence independently represents an optionally substituted C1 to C6 aliphatic hydrocarbon group; Rab2 in each occurrence independently represents a C1 to C12 fluorinated alkyl group.
Public/Granted literature
- US20120100482A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2012-04-26
Information query
