Invention Grant
- Patent Title: Alkali-soluble resin and negative-type photosensitive resin composition comprising the same
- Patent Title (中): 碱溶性树脂和含有它们的负型感光性树脂组合物
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Application No.: US13742197Application Date: 2013-01-15
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Publication No.: US08951713B2Publication Date: 2015-02-10
- Inventor: Han Soo Kim , Sung Hyun Kim , Kwang Han Park , Min Young Lim , Yoon Hee Heo , Ji Heum Yoo , Sun Hwa Kim
- Applicant: LG Chem, Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2007-0108043 20071026
- Main IPC: G03F7/033
- IPC: G03F7/033 ; G03F7/027 ; G03F7/00 ; G03F7/038 ; C08F2/38 ; C08F120/18 ; C08F220/06 ; C08F220/10 ; C08F222/00
Abstract:
An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a resin having the same molecular weight. Further provided is a negative-type photosensitive resin composition comprising the alkali-soluble resin as a binder resin. The use of the alkali-soluble resin lowers the overall viscosity of the photosensitive resin composition to effectively reduce the height of a stepped portion of a photoresist pattern using a small amount of the photosensitive resin composition.
Public/Granted literature
- US20130130176A1 ALKALI-SOLUBLE RESIN AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME Public/Granted day:2013-05-23
Information query
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