Invention Grant
- Patent Title: Resistive switching in memory cells
- Patent Title (中): 存储单元中的电阻式切换
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Application No.: US13078679Application Date: 2011-04-01
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Publication No.: US08951829B2Publication Date: 2015-02-10
- Inventor: D.V. Nirmal Ramaswamy , Gurtej S. Sandhu
- Applicant: D.V. Nirmal Ramaswamy , Gurtej S. Sandhu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Brooks, Cameron & Huebsch, PLLC
- Main IPC: H01L27/112
- IPC: H01L27/112 ; H01L45/00

Abstract:
Methods, devices, and systems associated with oxide based memory can include a method of forming a resistive switching region of a memory cell. Forming a resistive switching region of a memory cell can include forming a metal oxide material on an electrode and forming a metal material on the metal oxide material, wherein the metal material formation causes a reaction that results in a graded metal oxide portion of the memory cell.
Public/Granted literature
- US20120248396A1 RESISTIVE SWITCHING IN MEMORY CELLS Public/Granted day:2012-10-04
Information query
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