Invention Grant
US08951838B2 Low cost and ultra-thin chip on wafer on substrate (CoWoS) formation 有权
低成本和超薄芯片在晶圆上的基板(CoWoS)形成

Low cost and ultra-thin chip on wafer on substrate (CoWoS) formation
Abstract:
Methods of making and an integrated circuit device. An embodiment method includes patterning a first polymer layer disposed over a first copper seed layer, electroplating a through polymer via in the first polymer layer using the first copper seed layer, a via end surface offset from a first polymer layer surface, forming a second polymer layer over the first polymer layer, the second polymer layer patterned to expose the via end surface, and electroplating an interconnect in the second polymer layer to cap the via end surface using a second copper seed layer.
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