Invention Grant
- Patent Title: Method for manufacturing hydroxyl group-containing acetal compound
- Patent Title (中): 制备含羟基的缩醛化合物的方法
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Application No.: US13428671Application Date: 2012-03-23
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Publication No.: US08952203B2Publication Date: 2015-02-10
- Inventor: Takashi Ichikawa , Shuichi Yoshimura , Ken-ichiro Nakamoto
- Applicant: Takashi Ichikawa , Shuichi Yoshimura , Ken-ichiro Nakamoto
- Applicant Address: JP Tokyo
- Assignee: NOF Corporation
- Current Assignee: NOF Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-067148 20110325
- Main IPC: C07C41/58
- IPC: C07C41/58 ; C07C43/315

Abstract:
A method for manufacturing an acetal compound represented by the formula [1] in which the steps (A) to (D) as defined herein are performed sequentially, and an acetal compound of the formula [1] which is produced by the method: wherein n is 0 or 1 provided that R1 groups may be bonded or may not be bonded to each other when n is 0; R1 is an alkyl group having 1 or 2 carbon atoms or an alkylene group having 1 or 2 carbon atoms and the R1 groups may be same or different from each other; and R2 is an alkylene group having 1 or 6 carbon atoms.
Public/Granted literature
- US20120277477A1 Method For Manufacturing Hydroxyl Group-containing Acetal Compound Public/Granted day:2012-11-01
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