Invention Grant
- Patent Title: Dual resistance heater for phase change devices and manufacturing method thereof
- Patent Title (中): 用于相变装置的双电阻加热器及其制造方法
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Application No.: US13970207Application Date: 2013-08-19
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Publication No.: US08952299B2Publication Date: 2015-02-10
- Inventor: Yudong Kim , Ilya V Karpov , Charles C. Kuo , Greg Atwood , Maria Santina Marangon , Tyler A. Lowrey
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman Lundberg & Woessner, P.A.
- Priority: EP04107070 20041230
- Main IPC: H05B1/02
- IPC: H05B1/02 ; H05B3/02 ; B23K9/00 ; B23K9/02 ; H01L45/00 ; H01L27/24
Abstract:
A dual resistance heater for a phase change material region is formed by depositing a resistive material. The heater material is then exposed to an implantation or plasma which increases the resistance of the surface of the heater material relative to the remainder of the heater material. As a result, the portion of the heater material approximate to the phase change material region is a highly effective heater because of its high resistance, but the bulk of the heater material is not as resistive and, thus, does not increase the voltage drop and the current usage of the device.
Public/Granted literature
- US20140038379A1 DUAL RESISTANCE HEATER FOR PHASE CHANGE DEVICES AND MANUFACTURING METHOD THEREOF Public/Granted day:2014-02-06
Information query
