Invention Grant
US08952338B2 Crystalline quality evaluation apparatus for thin-film semiconductors, using μ-PCD technique
有权
使用μ-PCD技术的薄膜半导体晶体质量评估装置
- Patent Title: Crystalline quality evaluation apparatus for thin-film semiconductors, using μ-PCD technique
- Patent Title (中): 使用μ-PCD技术的薄膜半导体晶体质量评估装置
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Application No.: US13819288Application Date: 2011-09-01
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Publication No.: US08952338B2Publication Date: 2015-02-10
- Inventor: Naokazu Sakoda , Hiroyuki Takamatsu , Masahiro Inui , Futoshi Ojima
- Applicant: Naokazu Sakoda , Hiroyuki Takamatsu , Masahiro Inui , Futoshi Ojima
- Applicant Address: JP JP
- Assignee: Kobe Steel, Ltd.,Kobelco Research Institute Inc.
- Current Assignee: Kobe Steel, Ltd.,Kobelco Research Institute Inc.
- Current Assignee Address: JP JP
- Agency: Studebaker & Brackett PC
- Agent Donald R. Studebaker
- Priority: JP2010-211524 20100922
- International Application: PCT/JP2011/004911 WO 20110901
- International Announcement: WO2012/039099 WO 20120329
- Main IPC: G01T1/16
- IPC: G01T1/16 ; G01N21/63 ; H01L21/66 ; G01N21/84 ; G01N22/00

Abstract:
The present invention provides a crystalline quality evaluation apparatus (1) and a crystalline quality evaluation method for thin-film semiconductors, which are designed to evaluate crystalline quality of a sample (2) of a thin-film semiconductor (2a) by emitting excitation light and an electromagnetic wave to irradiate a measurement site of the sample (2), and detecting an intensity of a reflected electromagnetic wave from the sample (2). In the present invention, the thin-film semiconductor (2a) of the sample (2) is formed on an electrically conductive film (2b), and a dielectric (3) transparent to the excitation light is additionally disposed between the sample (2) and a waveguide (13) for emitting the electromagnetic wave therefrom. Thus, the thin-film semiconductor crystalline quality evaluation apparatus (1) and method configured in this manner make it possible to evaluate the crystalline quality even in the above situation where the electrically conductive film (2b) is formed under the semiconductor thin-film (2a).
Public/Granted literature
- US20130153778A1 CRYSTALLINE QUALITY EVALUATION APPARATUS FOR THIN-FILM SEMICONDUCTORS, USING +82 -PCD TECHNIQUE Public/Granted day:2013-06-20
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