Invention Grant
- Patent Title: Support and positioning structure, semiconductor equipment system and method for positioning
- Patent Title (中): 支撑定位结构,半导体设备系统及定位方法
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Application No.: US12970842Application Date: 2010-12-16
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Publication No.: US08952342B2Publication Date: 2015-02-10
- Inventor: Jerry Peijster , Aditya Mehendale , Andre Johannes Maria Hilderink
- Applicant: Jerry Peijster , Aditya Mehendale , Andre Johannes Maria Hilderink
- Applicant Address: NL Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL Delft
- Agency: Blakley Sokoloff Taylor & Zafman
- Main IPC: H01J37/20
- IPC: H01J37/20

Abstract:
The invention relates to a charged particle system provided with a support and positioning structure for supporting and positioning a target on a table, the support and positioning structure comprising a first member and a second member and at least one motor so as to move the first member relative to the second member, wherein a shield is present to shield at least one charged particle beam from electromagnetic fields generated by said at least one motor, the support and positioning structure further comprising a spring mechanically coupling the first member and the second member for at least partially bearing the weight of the first member, table and target.
Public/Granted literature
- US20110147612A1 SUPPORT AND POSITIONING STRUCTURE, SEMICONDUCTOR EQUIPMENT SYSTEM AND METHOD FOR POSITIONING Public/Granted day:2011-06-23
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