Invention Grant
US08952546B2 Integrated circuit designed and manufactured using diagonal minimum-width patterns
有权
集成电路使用对角线最小宽度图案设计和制造
- Patent Title: Integrated circuit designed and manufactured using diagonal minimum-width patterns
- Patent Title (中): 集成电路使用对角线最小宽度图案设计和制造
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Application No.: US14269413Application Date: 2014-05-05
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Publication No.: US08952546B2Publication Date: 2015-02-10
- Inventor: Akira Fujimura , Larry Lam Chau , Tam Dinh Thanh Nguyen
- Applicant: D2S, Inc.
- Applicant Address: US CA San Jose
- Assignee: D2S, Inc.
- Current Assignee: D2S, Inc.
- Current Assignee Address: US CA San Jose
- Agency: The Mueller Law Office, P.C.
- Main IPC: H01L29/72
- IPC: H01L29/72 ; G06F17/50 ; H01L27/02 ; H01L27/11
Abstract:
An integrated circuit comprising a plurality of standard cell circuit elements is disclosed, wherein for at least one layer of the integrated circuit, a majority of minimum-width patterns are in a preferred diagonal orientation.
Public/Granted literature
- US20140245247A1 Integrated Circuit Designed and Manufactured Using Diagonal Minimum-Width Patterns Public/Granted day:2014-08-28
Information query
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