Invention Grant
US08952617B2 Passive LC ballast and method of manufacturing a passive LC ballast
有权
无源LC镇流器和无源LC镇流器的制造方法
- Patent Title: Passive LC ballast and method of manufacturing a passive LC ballast
- Patent Title (中): 无源LC镇流器和无源LC镇流器的制造方法
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Application No.: US13505835Application Date: 2009-11-03
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Publication No.: US08952617B2Publication Date: 2015-02-10
- Inventor: Ron Shu Yuen Hui , Wai Man Ng , Deyan Lin
- Applicant: Ron Shu Yuen Hui , Wai Man Ng , Deyan Lin
- Applicant Address: HK Hong Kong
- Assignee: City University of Hong Kong
- Current Assignee: City University of Hong Kong
- Current Assignee Address: HK Hong Kong
- Agency: Renner Kenner Greive Bobak Taylor & Weber
- International Application: PCT/IB2009/007289 WO 20091103
- International Announcement: WO2011/055158 WO 20110512
- Main IPC: H05B41/36
- IPC: H05B41/36 ; H05B41/24 ; H05B41/295 ; H05B41/02 ; H01F38/10

Abstract:
The present invention provides a passive LC ballast and an associated method of manufacturing a passive LC ballast for use with any one of a plurality of high voltage discharge lamps. The passive LC ballast has an inductance and a capacitance selected in accordance with one of a set of one or more inductance-capacitance pairs. Each inductance-capacitance pair defines a respective inductance and a respective capacitance such that, when the inductance and the capacitance of the passive LC ballast is selected in accordance with any one of the inductance-capacitance pairs and the passive LC ballast is used with any one of the lamps, the lamp operates between respective minimum and maximum lamp powers of the lamp.
Public/Granted literature
- US20130106300A1 PASSIVE LC BALLAST AND METHOD OF MANUFACTURING A PASSIVE LC BALLAST Public/Granted day:2013-05-02
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