Invention Grant
- Patent Title: Immersion lithographic apparatus and device manufacturing method with asymmetric acceleration profile of substrate table to maintain meniscus of immersion liquid
- Patent Title (中): 浸没光刻设备和衬底台不对称加速度分布的装置制造方法,以保持浸液的弯液面
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Application No.: US12329145Application Date: 2008-12-05
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Publication No.: US08953141B2Publication Date: 2015-02-10
- Inventor: Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Christian Wagner , Rogier Hendrikus Magdalena Cortie
- Applicant: Martinus Hendrikus Antonius Leenders , Sjoerd Nicolaas Lambertus Donders , Christian Wagner , Rogier Hendrikus Magdalena Cortie
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20

Abstract:
A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid.
Public/Granted literature
- US20090161089A1 IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-06-25
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