Invention Grant
US08953656B2 III-nitride semiconductor laser device and method for fabricating III-nitride semiconductor laser device 有权
III族氮化物半导体激光器件及其制造方法

III-nitride semiconductor laser device and method for fabricating III-nitride semiconductor laser device
Abstract:
A Group III nitride semiconductor laser device includes a laser structure including a support substrate with a semipolar primary surface of a hexagonal Group III nitride semiconductor, and a semiconductor region thereon, and an electrode, provided on the semiconductor region, extending in a direction of a waveguide axis in the laser device. The c-axis of the nitride semiconductor is inclined at an angle ALPHA relative to a normal axis to the semipolar surface toward the waveguide axis direction. The laser structure includes first and second fractured faces intersecting with the waveguide axis. A laser cavity of the laser device includes the first and second fractured faces extending from edges of first and second faces. The first fractured face includes a step provided at an end face of an InGaN layer of the semiconductor region and extending in a direction from one side face to the other of the laser device.
Information query
Patent Agency Ranking
0/0