Invention Grant
US08954372B2 System and methods for using presence data to estimate affect and communication preference for use in a presence system
有权
用于使用存在数据来估计在存在系统中使用的影响和通信偏好的系统和方法
- Patent Title: System and methods for using presence data to estimate affect and communication preference for use in a presence system
- Patent Title (中): 用于使用存在数据来估计在存在系统中使用的影响和通信偏好的系统和方法
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Application No.: US13354414Application Date: 2012-01-20
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Publication No.: US08954372B2Publication Date: 2015-02-10
- Inventor: Jacob Biehl , Eleanor Rieffel , Althea Turner , William Van Melle , Anbang Xu
- Applicant: Jacob Biehl , Eleanor Rieffel , Althea Turner , William Van Melle , Anbang Xu
- Applicant Address: JP Tokyo
- Assignee: Fuji Xerox Co., Ltd.
- Current Assignee: Fuji Xerox Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Main IPC: G06F9/44
- IPC: G06F9/44 ; G06N7/02 ; G06N7/06 ; G06N5/04 ; G06N99/00

Abstract:
Exemplary embodiments described herein are directed to systems and methods that estimate a user's affect and communication preferences from presence data. The exemplary embodiments use a small set of features derived from a user's recent high level presence states. Exemplary embodiments also use features from broader classes of presence data. Utilizing features from a combination of presence data and recent presence states may provide improvement over estimates that users are able to make themselves. The exemplary embodiments further consider cost, burden on the user, and privacy issues in estimating affect and communication preferences.
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