Invention Grant
- Patent Title: Contour alignment system
- Patent Title (中): 轮廓对齐系统
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Application No.: US13645256Application Date: 2012-10-04
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Publication No.: US08954899B2Publication Date: 2015-02-10
- Inventor: Ping-Chieh Wu , Tzu-Chin Lin , Hung-Ting Lu , Wen-Chun Huang , Ru-Gun Liu
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F7/00

Abstract:
The present disclosure describes a method of calibrating a contour. The method includes designing an anchor pattern, printing the anchor pattern on a substrate, collecting scanning electron microscope (SEM) data of the printed anchor pattern on the substrate, wherein the SEM data includes a SEM image of the printed anchor pattern on the substrate, converting the SEM image of the printed anchor pattern on the substrate into a SEM contour of the printed anchor pattern, analyzing the SEM contour of the printed anchor pattern, and aligning the SEM contour of the anchor pattern to form the calibrated SEM contour.
Public/Granted literature
- US20140101624A1 CONTOUR ALIGNMENT SYSTEM Public/Granted day:2014-04-10
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