Invention Grant
- Patent Title: Method for manufacturing dental implant and dental implant
- Patent Title (中): 牙科植入物和牙科植入物的制造方法
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Application No.: US13649438Application Date: 2012-10-11
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Publication No.: US08961178B2Publication Date: 2015-02-24
- Inventor: Junichi Hayashi , Michio Ito
- Applicant: Seiko Epson Corporation
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2007-196495 20070727
- Main IPC: A61C8/00
- IPC: A61C8/00 ; A61C13/00

Abstract:
A dental implant comprises a titanium member composed of a sintered body made from titanium or titanium alloy; and a ceramic member composed of oxide-based ceramic, and the ceramic member fixed to the titanium member. The titanium member has a recess, and the ceramic member has a protrusion coupled to the recess and pores, and the titanium member covers the protrusion of the ceramic member. The protrusion has a cross-sectional area increasing portion whose cross-sectional area increases toward a dead-end portion of the recess in a direction away from a base end of the protrusion. The titanium member is firmly fixed and joined to the ceramic member in a state that a part of the titanium or the titanium alloy is penetrated into the pores of the protrusion of the ceramic member.
Public/Granted literature
- US20130034832A1 Method for Manufacturing Dental Implant and Dental Implant Public/Granted day:2013-02-07
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