Invention Grant
- Patent Title: Imprint lithography method and apparatus
- Patent Title (中): 压印光刻方法和装置
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Application No.: US12869381Application Date: 2010-08-26
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Publication No.: US08961801B2Publication Date: 2015-02-24
- Inventor: Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
- Applicant: Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsubry Winthrop Shaw Pittman LLP
- Main IPC: C03C15/00
- IPC: C03C15/00 ; B44C1/20 ; B82Y10/00 ; B82Y40/00 ; G03F7/00
Abstract:
In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
Public/Granted literature
- US20110049097A1 IMPRINT LITHOGRAPHY METHOD AND APPARATUS Public/Granted day:2011-03-03
Information query
