Invention Grant
- Patent Title: Tantalum recovery method
- Patent Title (中): 钽回收法
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Application No.: US14002351Application Date: 2012-03-16
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Publication No.: US08961910B2Publication Date: 2015-02-24
- Inventor: Tatsuya Aoki , Kenji Matsuzaki
- Applicant: Tatsuya Aoki , Kenji Matsuzaki
- Applicant Address: JP Tokyo
- Assignee: Mitsui Mining & Smelting Co., Ltd.
- Current Assignee: Mitsui Mining & Smelting Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Roberts & Roberts, LLP
- Priority: JPP2011-077826 20110331
- International Application: PCT/JP2012/056869 WO 20120316
- International Announcement: WO2012/132962 WO 20121004
- Main IPC: B01D11/00
- IPC: B01D11/00 ; C22B34/24 ; C22B1/00 ; C22B7/00

Abstract:
There is provided a technology for decreasing copper and tungsten contained in tantalum-containing wastes, and recovering a high-purity tantalum. The present invention is a tantalum recovery method for recovering tantalum from a tantalum-containing waste, the method comprising subjecting the tantalum-containing waste to an acid treatment in an oxidizing atmosphere, thereafter to a roasting treatment and an alkali treatment, and further comprising carrying out a magnetic separation treatment before the acid treatment to thereby separate a tantalum-containing material in the tantalum-containing waste. This is particularly a suitable recovery method for recovering tantalum from wastes containing a relatively large amount of copper and tungsten such as discarded substrates such as printed wiring boards.
Public/Granted literature
- US20130336858A1 TANTALUM RECOVERY METHOD Public/Granted day:2013-12-19
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