Invention Grant
- Patent Title: Tunnel field effect transistor
- Patent Title (中): 隧道场效应晶体管
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Application No.: US13270898Application Date: 2011-10-11
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Publication No.: US08963219B2Publication Date: 2015-02-24
- Inventor: Gilberto Curatola , Dusan Golubovic , Johannes Josephus Theodorus Marinus Donkers , Guillaume Boccardi , Hans Mertens
- Applicant: Gilberto Curatola , Dusan Golubovic , Johannes Josephus Theodorus Marinus Donkers , Guillaume Boccardi , Hans Mertens
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP10187157 20101011
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/76 ; H01L21/337 ; H01L29/739 ; B82Y10/00 ; H01L29/10 ; H01L29/165

Abstract:
A tunnel field effect transistor and a method of making the same. The transistor includes a semiconductor substrate. The transistor also includes a gate located on a major surface of the substrate. The transistor further includes a drain of a first conductivity type. The transistor also includes a source of a second conductivity type extending beneath the gate. The source is separated from the gate by a channel region and a gate dielectric. The transistor is operable to allow charge carrier tunnelling from an inversion layer through an upper surface of the source.
Public/Granted literature
- US20120086058A1 TUNNEL FIELD EFFECT TRANSISTOR Public/Granted day:2012-04-12
Information query
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