Invention Grant
- Patent Title: Imprint lithography template
- Patent Title (中): 印刷光刻模板
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Application No.: US12843657Application Date: 2010-07-26
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Publication No.: US08967991B2Publication Date: 2015-03-03
- Inventor: Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- Applicant: Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B29C59/00
- IPC: B29C59/00 ; G03F7/00 ; B82Y10/00 ; B82Y40/00 ; G03F9/00
Abstract:
An imprint lithography template is disclosed. In an embodiment, the template includes a patterned region to imprint a layer of imprintable medium, and an alignment mark for use in aligning the imprint template, the alignment mark configured such that imprintable medium is prevented from filling the alignment mark when the imprint template imprints the imprintable medium.
Public/Granted literature
- US20110018168A1 IMPRINT LITHOGRAPHY TEMPLATE Public/Granted day:2011-01-27
Information query
