Invention Grant
- Patent Title: Cathode selection method
- Patent Title (中): 阴极选择方法
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Application No.: US14064520Application Date: 2013-10-28
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Publication No.: US08968045B2Publication Date: 2015-03-03
- Inventor: Kenichi Saito
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-239012 20121030
- Main IPC: H01J9/42
- IPC: H01J9/42 ; H01J1/13

Abstract:
A cathode selection method includes measuring, by using a cathode having an electron emission surface which is a flat surface and a emission area which is limited, a total emission emitted from the cathode; calculating, using a measured total emission value, work function by a Richardson Dash Man's formula; and determining whether or not the cathode has the work function equal to or under an acceptable value.
Public/Granted literature
- US20140117839A1 CATHODE SELECTION METHOD Public/Granted day:2014-05-01
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