Invention Grant
- Patent Title: Polishing pad with alignment feature
- Patent Title (中): 具有对准功能的抛光垫
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Application No.: US13101826Application Date: 2011-05-05
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Publication No.: US08968058B2Publication Date: 2015-03-03
- Inventor: Robert Kerprich , William C. Allison , Diane Scott
- Applicant: Robert Kerprich , William C. Allison , Diane Scott
- Applicant Address: US OR Hillsboro
- Assignee: NexPlanar Corporation
- Current Assignee: NexPlanar Corporation
- Current Assignee Address: US OR Hillsboro
- Agency: Blakely Sokoloff Taylor Zafman LLP
- Main IPC: B24D11/00
- IPC: B24D11/00 ; B29C44/22 ; B29C44/04 ; B24B37/20 ; B24B37/26 ; B24D18/00 ; B24B37/005
Abstract:
Polishing pads with alignment marks are described. Methods of fabricating polishing pads with alignment marks are also described.
Public/Granted literature
- US20120282849A1 POLISHING PAD WITH ALIGNMENT FEATURE Public/Granted day:2012-11-08
Information query
