Invention Grant
- Patent Title: Valve and processing apparatus provided with the same
- Patent Title (中): 阀门和加工设备配备有相同的
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Application No.: US12598238Application Date: 2008-04-30
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Publication No.: US08968472B2Publication Date: 2015-03-03
- Inventor: Toshihisa Nozawa
- Applicant: Toshihisa Nozawa
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: IPUSA, PLLC
- Priority: JP2007-123266 20070508; JP2007-123267 20070508
- International Application: PCT/JP2008/058279 WO 20080430
- International Announcement: WO2008/139937 WO 20081120
- Main IPC: F16K3/06
- IPC: F16K3/06 ; F16K3/04 ; C23C16/455
Abstract:
A disclosed valve comprises a first valve body including first and second openings that permit gaseous communication between a chamber and an evacuation apparatus; a sealing valve element that moves near/away from the second opening to open/close the second opening; a sealing member provided in the sealing valve element to seal the second opening when the sealing valve element closes the second opening; a valve element retreat area that is provided in an inner wall of the first valve body away from the second opening, and shields the sealing member from an inside of the first valve body when the sealing valve element is moved to the valve element retreat area; and a first pivot shaft that pivots the sealing valve element so that the sealing valve element may be located in one of the second opening and the valve element retreat area.
Public/Granted literature
- US20100132891A1 VALVE AND PROCESSING APPARATUS PROVIDED WITH THE SAME Public/Granted day:2010-06-03
Information query
