Invention Grant
- Patent Title: Safe separation for nano imprinting
- Patent Title (中): 纳米压印安全分离
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Application No.: US13095514Application Date: 2011-04-27
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Publication No.: US08968620B2Publication Date: 2015-03-03
- Inventor: Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
- Applicant: Se-Hyuk Im , Mahadevan GanapathiSubramanian , Edward Brian Fletcher , Niyaz Khusnatdinov , Gerard M. Schmid , Mario Johannes Meissl , Anshuman Cherala , Frank Y. Xu , Byung-Jin Choi , Sidlgata V. Sreenivasan
- Applicant Address: US TX Austin US TX Austin
- Assignee: Canon Nanotechnologies, Inc.,Molecular Imprints, Inc.
- Current Assignee: Canon Nanotechnologies, Inc.,Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin US TX Austin
- Agent Cameron A. King
- Main IPC: B29C45/76
- IPC: B29C45/76 ; G03F7/00 ; B82Y10/00 ; B82Y40/00
Abstract:
Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
Public/Granted literature
- US20110260361A1 SAFE DEPARATION FOR NANO IMPRINTING Public/Granted day:2011-10-27
Information query
