Invention Grant
- Patent Title: Method of manufacturing a light emitting device
- Patent Title (中): 制造发光器件的方法
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Application No.: US12467497Application Date: 2009-05-18
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Publication No.: US08968823B2Publication Date: 2015-03-03
- Inventor: Shunpei Yamazaki , Takeshi Fukunaga
- Applicant: Shunpei Yamazaki , Takeshi Fukunaga
- Applicant Address: JP
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Husch Blackwell LLP
- Priority: JP11-371349 19991227
- Main IPC: B05D5/06
- IPC: B05D5/06 ; C23C16/04 ; H01L51/00 ; C23C14/04 ; C23C14/24 ; C23C14/56 ; H01L27/32 ; H01L51/50

Abstract:
Disclosed is an evaporation method to form a thin film over a substrate, which is characterized in the use of an evaporation source equipped with a plurality of evaporation cells. The evaporation source has a rectangular shape with a long side and a short side wherein the long side is longer than the short side. At least one of the evaporation source and the substrate is relatively moved during the evaporation, which allows the formation of a thin film having a highly uniform thickness in a short time.
Public/Granted literature
- US20100021624A1 Film Formation Apparatus and Method for Forming a Film Public/Granted day:2010-01-28
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