Invention Grant
US08968838B2 Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
有权
在具有梯形波形激励的电容耦合电抗器中的等离子体处理
- Patent Title: Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
- Patent Title (中): 在具有梯形波形激励的电容耦合电抗器中的等离子体处理
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Application No.: US13809784Application Date: 2011-07-12
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Publication No.: US08968838B2Publication Date: 2015-03-03
- Inventor: Jean-Paul Booth , Erik Johnson
- Applicant: Jean-Paul Booth , Erik Johnson
- Applicant Address: FR Palaiseau FR Paris
- Assignee: Ecole Polytechnique,Centre National de la Recherche Scientifique
- Current Assignee: Ecole Polytechnique,Centre National de la Recherche Scientifique
- Current Assignee Address: FR Palaiseau FR Paris
- Agency: Greer, Burns & Crain, Ltd.
- Priority: EP10169735 20100715
- International Application: PCT/EP2011/061894 WO 20110712
- International Announcement: WO2012/007483 WO 20120119
- Main IPC: C23C16/509
- IPC: C23C16/509 ; H01J37/32

Abstract:
A method is provided for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a trapezoidal waveform comprising a ramp-up, a high plateau, a ramp-down and a low plateau. The plasma density can be controlled by adjusting the duration of the ramp-up, the duration of the ramp-down, the amplitude and the repetition rate of the trapezoidal waveform. The ion energy distribution function at the substrate can be controlled by adjusting the amplitude and the relative duration between the high plateau and the low plateau of the trapezoidal waveform.
Public/Granted literature
- US20130136872A1 PLASMA PROCESSING IN A CAPACITIVELY-COUPLED REACTOR WITH TRAPEZOIDAL-WAVEFORM EXCITATION Public/Granted day:2013-05-30
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