Invention Grant
- Patent Title: Pellicles with reduced particulates
- Patent Title (中): 具有减少颗粒的薄膜
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Application No.: US13789894Application Date: 2013-03-08
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Publication No.: US08968971B2Publication Date: 2015-03-03
- Inventor: Ching-Bore Wang
- Applicant: Micro Lithography, Inc.
- Applicant Address: US CA Sunnyvale
- Assignee: Micro Lithography, Inc.
- Current Assignee: Micro Lithography, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: Schwabe, Williamson & Wyatt
- Main IPC: G03F1/64
- IPC: G03F1/64
Abstract:
Pellicles for photomasks used in photolithographic manufacturing are described. A frame of a pellicle may include a recess formed in a side member and a locking member dimensioned to secure a membrane to the frame when the membrane is disposed between the recess and the locking member. A pellicle may be secured to a photomask using non-adhesive attachment members that contact a side surface of the photomask.
Public/Granted literature
- US20140255827A1 PELLICLES WITH REDUCED PARTICULATES Public/Granted day:2014-09-11
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