Invention Grant
- Patent Title: Photosensitive resin composition
- Patent Title (中): 感光树脂组合物
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Application No.: US13574354Application Date: 2010-11-19
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Publication No.: US08968984B2Publication Date: 2015-03-03
- Inventor: Pil Rye Yang , Kyung Keun Yoon , Yun Jae Lee
- Applicant: Pil Rye Yang , Kyung Keun Yoon , Yun Jae Lee
- Applicant Address: KR Gwacheon-si
- Assignee: Kolon Industries, Inc.
- Current Assignee: Kolon Industries, Inc.
- Current Assignee Address: KR Gwacheon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2009-0112861 20091120; KR10-2010-0107219 20101029
- International Application: PCT/KR2010/008212 WO 20101119
- International Announcement: WO2011/062446 WO 20110526
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/028

Abstract:
Disclosed is a photosensitive resin composition for an organic insulating layer. More specifically, the photosensitive resin composition is suitable for forming a substrate of a transflective thin film transistor liquid crystal display (TFT-LCD) or a pattern of an interlayer insulating layer by improving remarkably a pattern property with a high taper angle besides improvement of flatness, sensitivity, heat resistance, and transparency. Particularly, the photosensitive resin composition can provide low power dissipation besides a wide viewing angle and high visibility when being applied to a transflective type display. In addition, the photosensitive resin composition can provide a clear screen under natural light without a backlight by maintaining the brightness of a screen and prominent field visibility.
Public/Granted literature
- US20130344437A1 PHOTOSENSITIVE RESIN COMPOSITION Public/Granted day:2013-12-26
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