Invention Grant
- Patent Title: Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates
- Patent Title (中): 酸性酸性蚀刻溶液和用于纹理化单晶和多晶硅衬底表面的方法
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Application No.: US13394349Application Date: 2010-09-09
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Publication No.: US08969276B2Publication Date: 2015-03-03
- Inventor: Simon Braun , Julian Proelss , Ihor Melnyk , Michael Michel , Stefan Mathijssen
- Applicant: Simon Braun , Julian Proelss , Ihor Melnyk , Michael Michel , Stefan Mathijssen
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/EP2010/063209 WO 20100909
- International Announcement: WO2011/032880 WO 20110324
- Main IPC: H01L31/0236
- IPC: H01L31/0236 ; C09K13/08 ; C11D11/00

Abstract:
An aqueous acidic etching solution suitable for texturing the surface of single crystal and polycrystal silicon substrates and containing, based on the complete weight of the solution, 3 to 10% by weight of hydrofluoric acid; 10 to 35% by weight of nitric acid; 5 to 40% by weight of sulfuric acid; and 55 to 82% by weight of water; a method for texturing the surface of single crystal and polycrystal silicon substrates comprising the step of (1) contacting at least one major surface of a substrate with the said aqueous acidic etching solution; (2) etching the at least one major surface of the substrate for a time and at a temperature sufficient to obtain a surface texture consisting of recesses and protrusions; and (3) removing the at least one major surface of the substrate from the contact with the aqueous acidic etching solution; and a method for manufacturing photovoltaic cells and solar cells using the said solution and the said texturing method.
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