Invention Grant
US08969629B2 Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method
有权
环化合物，其制备方法，辐射敏感组合物和抗蚀剂图案形成方法
- Patent Title: Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method
- Patent Title (中): 环化合物，其制备方法，辐射敏感组合物和抗蚀剂图案形成方法
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Application No.: US13512099Application Date: 2010-11-25
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Publication No.: US08969629B2Publication Date: 2015-03-03
- Inventor: Masaaki Takasuka , Masatoshi Echigo , Yu Okada
- Applicant: Masaaki Takasuka , Masatoshi Echigo , Yu Okada
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee: Mitsubishi Gas Chemical Company, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Fitch, Even, Tabin & Flannery, LLP
- Priority: JP2009-270652 20091127; JP2009-270653 20091127; JP2010-138525 20100617
- International Application: PCT/JP2010/006895 WO 20101125
- International Announcement: WO2011/065004 WO 20110603
- Main IPC: C07C41/30
- IPC: C07C41/30 ; C07C43/23 ; C07C43/253 ; G03F7/038
Abstract:
Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.
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