Invention Grant
- Patent Title: Plasma treatment installation
- Patent Title (中): 等离子体处理装置
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Application No.: US11798795Application Date: 2007-05-17
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Publication No.: US08969753B2Publication Date: 2015-03-03
- Inventor: Siegfried Straemke
- Applicant: Siegfried Straemke
- Agency: Miles & Stockbridge P.C.
- Agent David R. Schaffer
- Priority: DE202006007937U 20060518
- Main IPC: B23K9/00
- IPC: B23K9/00 ; C23F1/00 ; C23C14/00 ; C23C16/458 ; C23C14/50 ; H01L21/677 ; H01L21/687

Abstract:
A plasma treatment installation including at least two stationary workpiece holders adapted for controlled rotation about their respective axis and having supporting plates for supporting workpieces for the treatment thereof, at least one hood to be set on a workpiece holder that is adapted to enclose each of a plurality of workpiece holders to form a sealed treatment space, and a manipulator for automatically equipping the supporting plates of a workpiece holder with workpieces, while the other workpiece holder is covered by the hood to perform the plasma treatment of the workpieces.
Public/Granted literature
- US20070267389A1 Plasma treatment installation Public/Granted day:2007-11-22
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