Invention Grant
US08969838B2 Systems and methods for protecting an EUV light source chamber from high pressure source material leaks
有权
用于保护EUV光源室免受高压源材料泄漏的系统和方法
- Patent Title: Systems and methods for protecting an EUV light source chamber from high pressure source material leaks
- Patent Title (中): 用于保护EUV光源室免受高压源材料泄漏的系统和方法
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Application No.: US12460762Application Date: 2009-07-23
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Publication No.: US08969838B2Publication Date: 2015-03-03
- Inventor: Georgiy O. Vaschenko , Krishna Ramadurai , Richard Charles Taddiken
- Applicant: Georgiy O. Vaschenko , Krishna Ramadurai , Richard Charles Taddiken
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G21K5/04
- IPC: G21K5/04 ; G05D7/06 ; G03F7/20 ; H05G2/00
Abstract:
A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component.
Public/Granted literature
- US20100258747A1 Systems and methods for protecting an EUV light source chamber from high pressure source material leaks Public/Granted day:2010-10-14
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