Invention Grant
- Patent Title: Semiconductor film composition
- Patent Title (中): 半导体薄膜组成
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Application No.: US12097869Application Date: 2006-07-31
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Publication No.: US08969865B2Publication Date: 2015-03-03
- Inventor: Gregory Herman , David Punsalan , Randy Hoffman , Jeremy Anderson , Douglas Keszler , David Blessing
- Applicant: Gregory Herman , David Punsalan , Randy Hoffman , Jeremy Anderson , Douglas Keszler , David Blessing
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Agency: Dierker & Associates, P.C.
- International Application: PCT/US2006/029990 WO 20060731
- International Announcement: WO2007/046930 WO 20070426
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/12 ; H01L21/02 ; H01L29/786

Abstract:
A semiconductor film composition includes an oxide semiconductor material. At least one polyatomic ion is incorporated into the oxide semiconductor material.
Public/Granted literature
- US20100044698A1 Semiconductor Film Composition Public/Granted day:2010-02-25
Information query
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