Invention Grant
- Patent Title: Semiconductor light device and fabrication method thereof
- Patent Title (中): 半导体光器件及其制造方法
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Application No.: US10534489Application Date: 2003-11-17
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Publication No.: US08969883B2Publication Date: 2015-03-03
- Inventor: Sung Ho Choo , Ja Soon Jang
- Applicant: Sung Ho Choo , Ja Soon Jang
- Applicant Address: KR Seoul
- Assignee: LG Innotek Co., Ltd.
- Current Assignee: LG Innotek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2002-0071432 20021116; KR10-2003-0058209 20030822; KR10-2003-0058210 20030822
- International Application: PCT/KR03/02468 WO 20031117
- International Announcement: WO2004/047189 WO 20040603
- Main IPC: H01L33/30
- IPC: H01L33/30 ; H01L33/40 ; H01L33/32

Abstract:
The present invention discloses a light device and a fabrication method thereof. An object of the present invention is to provide the light device and the fabrication method thereof an electric/thermal/structural stability is obtained, and a P-type electrode and an N-type electrode can be simultaneously formed. In order to achieve the above object, the inventive light device includes: a GaN-based layer; a high concentration GaN-based layer formed on the GaN-based layer; a first metal-Ga compound layer formed on the high concentration GaN-based layer; a first metal layer formed on the first metal-Ga compound layer; a third metal-Al compound layer formed on the first metal layer; and a conductive oxidation preventive layer formed on the third metal-Al compound layer.
Public/Granted literature
- US20070029568A1 Light emitting device and fabrication method thereof Public/Granted day:2007-02-08
Information query
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