Invention Grant
US08969949B2 Structure and method for static random access memory device of vertical tunneling field effect transistor
有权
垂直隧道场效应晶体管的静态随机存取存储器件的结构与方法
- Patent Title: Structure and method for static random access memory device of vertical tunneling field effect transistor
- Patent Title (中): 垂直隧道场效应晶体管的静态随机存取存储器件的结构与方法
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Application No.: US13792152Application Date: 2013-03-10
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Publication No.: US08969949B2Publication Date: 2015-03-03
- Inventor: Harry-Hak-Lay Chuang , Bao-Ru Young , Wei Cheng Wu , Yi-Ren Chen , Ming Zhu
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/66 ; H01L29/423 ; H01L29/739 ; H01L29/06

Abstract:
The present disclosure provides one embodiment of a SRAM cell that includes first and second inverters cross-coupled for data storage, each inverter including at least one pull-up device and at least one pull-down devices; and at least two pass-gate devices configured with the two cross-coupled inverters. The pull-up devices, the pull-down devices and the pass-gate devices include a tunnel field effect transistor (TFET) that further includes a semiconductor mesa formed on a semiconductor substrate and having a bottom portion, a middle portion and a top portion; a drain of a first conductivity type formed in the bottom portion and extended into the semiconductor substrate; a source of a second conductivity type formed in the top portion, the second conductivity type being opposite to the first conductivity type; a channel in a middle portion and interposed between the source and drain; and a gate formed on sidewall of the semiconductor mesa and contacting the channel.
Public/Granted literature
Information query
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